We prepared thin, amorphous, compositionally modulated films (CMF) by RF sequential co-sputtering with Co, B, and Fe targets. In principle this technique can produce controlled, small (<15 Å) scale modulations in composition. The in-plane anisotropies and coercivities of the CMF were more than one magnitude larger than those of typical thin, homogeneous, amorphous, alloy films (AF). The increase in anisotropy was growth induced and could be reduced by annealing to values comparable to those of amorphous AF. The coercivity, however, could not be significantly decreased by annealing, except in CMvF with the highest boron concentration. The stability of the coercivity might, therefore, be an observable consequence of the small scale composition heterogeneity.