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Accepted manuscript

High-brightness betatron X-ray source driven by SULF-1 PW laser

Published online by Cambridge University Press:  19 February 2025

Hong Zhang Open the ORCID record for Hong Zhang [Opens in a new window] ,
Zhigang Deng ,
Hai Jiang ,
Shaoyi Wang ,
Jianmeng Wei ,
Yanjie Ge ,
Genbai Chu ,
Xizhuan Chen ,
Hao Wang  and
Yonghong Yan
...Show all authors
Hong Zhang
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China University of Chinese Academy of Sciences, Beijing, China
Zhigang Deng
Affiliation:
Science and Technology on Plasma Physics Laboratory, Laser Fusion Research Center, China Academy of Engineering Physics, Mianyang, China
Hai Jiang
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Shaoyi Wang
Affiliation:
Science and Technology on Plasma Physics Laboratory, Laser Fusion Research Center, China Academy of Engineering Physics, Mianyang, China
Jianmeng Wei
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Yanjie Ge
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China University of Chinese Academy of Sciences, Beijing, China
Genbai Chu
Affiliation:
Science and Technology on Plasma Physics Laboratory, Laser Fusion Research Center, China Academy of Engineering Physics, Mianyang, China
Xizhuan Chen
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China University of Chinese Academy of Sciences, Beijing, China
Hao Wang
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Yonghong Yan
Affiliation:
Science and Technology on Plasma Physics Laboratory, Laser Fusion Research Center, China Academy of Engineering Physics, Mianyang, China
Ke Feng
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Kangnan Jiang
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Runshu Hu
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China University of Chinese Academy of Sciences, Beijing, China
Fang Tan
Affiliation:
Science and Technology on Plasma Physics Laboratory, Laser Fusion Research Center, China Academy of Engineering Physics, Mianyang, China
Gaojie Zeng
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Hang Guo
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China University of Chinese Academy of Sciences, Beijing, China
Xintao Yang
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China University of Chinese Academy of Sciences, Beijing, China
Jiayi Qian
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Jiacheng Zhu
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Zongxin Zhang
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Yi Xu
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Yuxin Leng
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Weimin Zhou
Affiliation:
Science and Technology on Plasma Physics Laboratory, Laser Fusion Research Center, China Academy of Engineering Physics, Mianyang, China
Song Li*
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Wentao Wang*
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China
Ruxin Li
Affiliation:
Key Laboratory of Ultra-intense laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai, China School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai, China
*
*[email protected]
**[email protected]
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Abstract

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Keywords

Betatron radiationLaser wakefield acceleratorX-ray phase contrast imagingSULF-1PW laser
Type
Research Article
Information
High Power Laser Science and Engineering , Accepted manuscript , pp. 1 - 24
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (https://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
© The Author(s), 2025. Published by Cambridge University Press in association with Chinese Laser Press