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Using multi-dimensional contact mechanics experiments to measure Poisson's ratio of porous low-k films

Published online by Cambridge University Press:  01 February 2011

B. N. Lucas ,
J. C. Hay  and
W. C. Oliver
B. N. Lucas
Affiliation:
Fast Forward Devices, LLC
J. C. Hay
Affiliation:
Fast Forward Devices, LLC
W. C. Oliver
Affiliation:
MTS Nano Instruments Innovation Center
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Abstract

Using a new multi-dimensional contact mechanics system, it was recently shown that the experimentally measured tangential to normal stiffness ratio of a contact can be described as a function of the bulk Poisson's ratio of the material as predicted by Mindlin [1-3]. This system has been utilized to measure the normal and tangential elastic contact stiffness of a series of porous low-k films, with increasing starting porogen content. These results indicate a transition from a material-controlled elastic behavior to a structure-controlled elastic behavior as the porosity of the film is increased. These structural effects and their potential influence on the mechanical response to forces imposed on integrated circuits are discussed. The experimental details and apparatus are introduced and described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 766: Symposium E – Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics - 2003 , 2003 , E9.5
Copyright
Copyright © Materials Research Society 2003

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References

1. Mindlin, R. D., Trans. ASME, Series E, Journal of Applied Mechanics, 16, (1949) P. 259.Google Scholar
2. Johnson, K. L., Contact Mechanics, 4th ed. (Cambridge Univ. Press. Cambridge, England, 1985) P. 1, 211–219.Google Scholar
3. Lucas, B. N., Hay, J. C., and Oliver, W. C., submitted to JMR.Google Scholar
4. Oliver, W. C. and Pharr, G. M., J. Mater. Res., 7, (1992) P. 1564–83.Google Scholar
5. Small, M. K. and Nix, W. D., J. Mater. Res., 7, (1992) P. 1553–1563.Google Scholar
6. Flannery, C. M., Wittkowski, T., Jung, K., and Hillebrands, B., and Baklanov, M. R., App. Phys. Ltrs., 80, No. 24 (2002) P. 4594–4596.Google Scholar
7. Lakes, R. S., Science, 235, (1987) P. 1038–1040.Google Scholar