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Synthesis of Nanocomposite thin film Ti/Al Multilayers and Ti-Aluminides

Published online by Cambridge University Press:  10 February 2011

R. Banerjee ,
X. D. Zhang ,
S. A. Dregia  and
H. L. Fraser
R. Banerjee
Affiliation:
Department of Materials Science and Engineering, The Ohio State University, Columbus, OH 43210
X. D. Zhang
Affiliation:
Department of Materials Science and Engineering, The Ohio State University, Columbus, OH 43210
S. A. Dregia
Affiliation:
Department of Materials Science and Engineering, The Ohio State University, Columbus, OH 43210
H. L. Fraser
Affiliation:
Department of Materials Science and Engineering, The Ohio State University, Columbus, OH 43210
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Abstract

Nanocomposite Ti/Al multilayered thin films have been deposited by magnetron sputtering. These multilayers exhibit interesting structural transitions on reducing the layer thickness of both Ti and Al. Ti transforms from its bulk stable hep structure to fee and Al transforms from fee to hep. The effect of ratio of Ti layer thickness to Al layer thickness on the structural transitions has been investigated for a constant bilayer periodicity of 10 nm by considering three different multilayers: 7.5 nm Ti / 2.5 nm Al, 5 nm Ti / 5 nm Al and 2.5 nm Ti / 7.5 nm Al. The experimental results have been qualitatively explained on the basis of a thermodynamic model. Preliminary experimental results of interfacial reactions in Ti/Al bilayers resulting in the formation of Ti-aluminides are also presented in the paper.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 457: Symposium V – Nanophase and Nanocomposite Materials II , 1996 , 309
Copyright
Copyright © Materials Research Society 1997

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References

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