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Surface Chemical Studies of Oxides and Nitrides

Published online by Cambridge University Press:  22 February 2011

Carlo G. Pantano
Carlo G. Pantano*
Affiliation:
Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA 16802
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Abstract

The application of surface analysis techniques for the study of fundamental surface and thin film phenomena is described. The topics covered relate to the processing and fabrication of electronic packages and include: evaporation/condensation during the thermal processing of glasses, hydration of glass surfaces and thin films, nitridation of silica films, diffusion behavior in oxides at low temperature, and impurity segregation in thin films. A wide variety of surface analytical methods are exemplified including Auger electron spectroscopy (AES), ion-scattering spectroscopy (ISS), nuclear reaction analysis (NRA), secondary-ion mass spectroscopy (SIMS) and x-ray photoelectron spectroscopy (XPS).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 40: Symposium J – Electronic Packaging Materials Science I , 1984 , 303
Copyright
Copyright © Materials Research Society 1985

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