Hostname: page-component-55f67697df-gmt7q Total loading time: 0 Render date: 2025-05-08T21:29:25.406Z Has data issue: false hasContentIssue false
  • English
  • Français

Purposeful Chemical Design of Mocvd Precursors for Silicon-Based Systems

Published online by Cambridge University Press:  25 February 2011

Bernard J. Aylett
Bernard J. Aylett*
Affiliation:
Department of Chemistry, Queen Mary College, London El 4NS, U.K.
Get access

Abstract

It is shown that volatile molecular compounds with silicon-metal bonds can act as effective MOCVD precursors to metal silicides, which aredeposited as thin films under relatively mild conditions. Strategies for the design and synthesis of such “prevenient” precursors are explored, and possible extensions of this approach are considered.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 131: Symposium E – Chemical Perspectives of Microelectronic Materials I , 1988 , 383
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

REFERENCES

1. Manasevit, H.M. and Simpson, W.I., J. Electrochem. Soc. 116, 1725 (1969).Google Scholar
2. Cooke, H.M., Vacuum 35, 67 (1985) and refs. therein; P.K. Tedrow, V. Ilderem and R. Reif, Appl. Physics Letters 46, 189 (1985).Google Scholar
3. Bouteville, A., Royer, A., and Remy, J.-C., Proceedings 6th EUROCVD Conference Jerusalem, Israel, March 1987, p. 264.Google Scholar
4. Aylett, B.J., Brit. Polymer J. 18, 359 (1986).CrossRefGoogle Scholar
5. Murarka, S.P., Silicides for VLSI Applications, Academic Press, New York, 1983 Google Scholar
6. Piper, T.S., Lemal, D., and Wilkinson, G., Naturwiss. 43, 129 (1956).Google Scholar
7. B.J. Aylett and J.M. Campbell, Chem. Comm. 1965, Chalk, A.J. and Harrod, J.F., J. Am. Chem. Soc. 87, 1133 (1965).CrossRefGoogle Scholar
8. Aylett, B.J., Adv. Inorg. Chem. Radiochem. 25, 1 (1982).Google Scholar
9. Aylett, B.J. and Burne, A.R., unpublished observations.Google Scholar
10. Aylett, B.J. and Colquhoun, H.M., J. Chem. Soc., Dalton Trans. 1977, 2058.CrossRefGoogle Scholar
11. Aylett, B.J., in Transformation of Organometallics into Common and Exotic Materials (ed. Laine, R.M.). NATO ASI Series E: Applied Sciences - No. 141, Martinus Nijhoff, Dordrecht, 1988.Google Scholar
12. see: Aylett, B.J. and Taghipour, M.T., J. Organometal. Chem. 249, 55 (1983).CrossRefGoogle Scholar
13. Aylett, B.J. and Tannahill, A.A., Vacuum, 35, 435 (1985).CrossRefGoogle Scholar
14. Stauf, G.T., Dowben, P.A., Boag, N.M., de la Garza, L.M., and Dowben, S.L., Thin Solid Films 156, 327 (1988).Google Scholar
15. Aylett, B.J. and Hampden-Smith, M.J., unpublished results.Google Scholar
16. Brooks, T.A. and Hess, D.W., Thin Solid Films 153, 521 (1987).Google Scholar
17. Aylett, B.J. and Peterson, L.K., unpublished results.Google Scholar