Hostname: page-component-55f67697df-bzg56 Total loading time: 0 Render date: 2025-05-09T12:03:25.964Z Has data issue: false hasContentIssue false
  • English
  • Français

Optical Fiber Pyrometry with in-Situ Detection of Wafer Radiance and Emittance—Accufiber's Ripple Method

Published online by Cambridge University Press:  21 February 2011

A. T. Fiory ,
C. Schietinger ,
B. Adams  and
F. G. Tinsley
A. T. Fiory
Affiliation:
AT&T Bell Laboratories, Murray Hill NJ 07974
C. Schietinger
Affiliation:
Accufiber Division, Luxtron Corporation, Beaverton OR 97005.
B. Adams
Affiliation:
Accufiber Division, Luxtron Corporation, Beaverton OR 97005.
F. G. Tinsley
Affiliation:
Accufiber Division, Luxtron Corporation, Beaverton OR 97005.
Get access

Abstract

A two-channel optical-fiber pyrometry technique for simultaneous measurement of thermal radiance and emittance was used to measure and control the temperature of silicon wafers heated by quartz-halogen-tungsten lamps in various rapid-thermal processors, including an A.G. Associates Heatpulse. The ripple method dynamically determines emittances by sensing time-dependent components in radiation from the lamps and radiation reflected by the wafer surface. Wafers were coated with films of various textures and patterns to test the technique over a range of surface emittances spanning about an order of magnitude. Temperature accuracies of at least ±5°C are achievable from 650°C to 1050°C, and above, for pyrometry at lμm wavelength.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 303: Symposium G – Rapid Thermal and Integrated Processing II , 1993 , 139
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

REFERENCES

[1] Schietinger, C., Adams, B., and Yarling, C., Mat. Res. Soc. Symp. Proc. 224, 23 (1991).Google Scholar
[2] Schietinger, C. W. and Adams, B. E., U.S. Patent No. 5 154 512 (October 13, 1992); U.S. Patent No. 5 166 080 (November 24, 1992).Google Scholar
[3] Quinn, T. J., Temperature (Academic Press, London, 1983), Chap. 7.Google Scholar