Hostname: page-component-669899f699-tpknm Total loading time: 0 Render date: 2025-05-05T10:44:41.871Z Has data issue: false hasContentIssue false
  • English
  • Français

Method for Measuring Profiles of Photoacid Patterns in Chemically Amplified Resists

Published online by Cambridge University Press:  17 March 2011

Gilbert D. Feke ,
Robert D. Grober ,
Gerd Pohlers  and
James F. Cameron
Gilbert D. Feke
Affiliation:
Department of Applied Physics, Yale University, New Haven, CT 06520-8284, U.S.A.
Robert D. Grober
Affiliation:
Department of Applied Physics, Yale University, New Haven, CT 06520-8284, U.S.A.
Gerd Pohlers
Affiliation:
Microelectronic Materials Research and Development Laboratories, Shipley Company, Marlborough, MA 01752, U.S.A.
James F. Cameron
Affiliation:
Microelectronic Materials Research and Development Laboratories, Shipley Company, Marlborough, MA 01752, U.S.A.
Get access

Abstract

We describe a method based on single molecule probing of acid concentration to measure the profiles of photogenerated acid patterns in chemically amplified resist films. We further present preliminary data which demonstrates the viability of this method.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 636: Symposium D – Nonlithographic and Lithographic Methods of Nanofabrication-From Ultralarge Scale , 2000 , D6.7.1
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

1. Seeger, D., Solid State Technol., 40, 115 (1997).Google Scholar
2. Pappas, S. P., J. Imaging Technol, 11, 146 (1985).Google Scholar
3. Ocola, L. E., Fryer, D. S., Reynolds, G., Krasnoperova, A., and Cerrina, F., Appl. Phys. Lett., 68, 717 (1996).Google Scholar
4. Ocola, L. E., Fryer, D. S., Nealey, P., DePablo, J., Cerrina, F., and Kammer, S., J. Vac. Sci. Technol., B14, 3974 (1996).Google Scholar
5. Dobisz, E. A., Brandow, S. L., Snow, E., and Bass, R., J. Vac. Sci. Technol., B15, 2318 (1997).Google Scholar
6. Ocola, L. E., Cerrina, F., and May, T., Appl. Phys. Lett., 71, 847 (1997).Google Scholar
7. Ocola, L. E., Cerrina, F., and May, T., J. Vac. Sci. Technol., B15, 2545 (1997).Google Scholar
8. Dobisz, E. A., Brandow, S. L., Bass, R., and Shirey, L. M., J. Vac. Sci. Technol., B16, 3695 (1998).Google Scholar
9. Marchman, H. M. and Novembre, A. E., Appl. Phys. Lett., 66, 3269 (1995).Google Scholar
10. Liddle, J. A., Fernandez, A. T., Cirelli, R., Mkrtchyan, M. M., Novembre, A. E., Peabody, M. L., and Watson, G. P., J. Vac. Sci. Technol., B15, 2162 (1997).Google Scholar
11. Liddle, J. A., Johnson, J. A., Cirelli, R., Mkrtchyan, M. M., Novembre, A. E., and Peabody, M. L., J. Vac. Sci. Technol., B16, 3651 (1998).Google Scholar
12. Dragnea, B., Preusser, J., Schade, W., Leone, S. R., and Hinsberg, W. D., J. Appl. Phys., 86, 2795 (1999).Google Scholar
13. Bukofsky, S. J., Feke, G. D., Wu, Q., Grober, R. D., Dentinger, P. M., and Taylor, J. W., Appl. Phys. Lett., 73, 408 (1998).Google Scholar
14. Zhang, P. L., Webber, S. E., Mendenhall, J., Byers, J. D., and Chao, K., Proc. SPIE, 3333, 794 (1998).Google Scholar
15. Dentinger, P. M., Lu, B., Taylor, J. W., Bukofsky, S. J., Feke, G. D., Hessman, D., and Grober, R. D., J. Vac. Sci. Technol., B16, 3767 (1998).Google Scholar
16. Lu, B., Taylor, J. W., Cerrina, F., Soo, C. P., and Bourdillon, A. J., J. Vac. Sci. Technol., B17, 3345 (1999).Google Scholar
17. Coenjarts, C., Cameron, J. F., Deschamps, N., Hambly, D., Pohlers, G., Scaiano, J. C., Sinta, R., Virdee, S., and Zampini, A., Proc. SPIE, 3678, 1062 (1999).Google Scholar
18. International Technology Roadmap for Semiconductors [Semiconductor Industry Association (SIA), 1999], found at http://public.itrs.net/files/1999_SIA_Roadmap/Home.htmGoogle Scholar
19. Uppenbrink, J. and Clery, D., Science, 283, 1667 (1999).Google Scholar
20. Tamarat, Ph., Maali, A., Lounis, B., and Orrit, M., J. Phys. Chem., A104, 1 (2000).Google Scholar
21. Brasselet, S. and Moerner, W. E., Single Mol., 1, 17 (2000).Google Scholar
22. Bobroff, N., Rev. Sci. Instrum., 57, 1152 (1986).Google Scholar
23. Ghosh, R. N. and Webb, W. W., Biophys. J., 66, 1301 (1994).Google Scholar
24. Schmidt, T., Schütz, G. J., Baumgartner, W., Gruber, H. J., and Schindler, H., J. Phys. Chem., 99, 17662 (1995).Google Scholar
25. Schütz, G. J., Trabesinger, W., and Schmidt, T., Biophys. J., 74, 2223 (1998).Google Scholar
26. Trabesinger, W., Schütz, G. J., Gruber, H. J., Schindler, H., and Schmidt, T., Anal. Chem., 71, 279 (1999).Google Scholar
27. Oijen, A. M. van, Köhler, J., Schmidt, J., Müller, M., and Brakenhoff, G. J., J. Opt. Soc. Am., A16, 909 (1999).Google Scholar
28. Kubitscheck, U., Kuckmann, O., Kues, T., and Peters, R., Biophys. J., 78, 2170 (2000).Google Scholar
29. Schutz, G. J., Kada, G., Pastushenko, V. P., and Schindler, H., EMBO J., 19, 892 (2000).Google Scholar
30. Crank, J., The Mathematics of Diffusion (Oxford University Press, Oxford, 1975).Google Scholar
31. Polster, J. and Lachmann, H., Spectrometric Titrations (VCH, New York, 1989).Google Scholar
32. Abdel-Mottaleb, M. S. A., Loutfy, R. O., and Lapouyade, R., Photochem, J.. Photobiol., A48, 87 (1989).Google Scholar
33. Abdel-Mottaleb, M. S. A., Antonious, M. S., Abo, M. M. Ali, Ismail, L. F. M., El-Sayed, B. A., and Sherief, A. M. K., Proc. Indian Acad. Sci., 104, 185 (1992).Google Scholar
34. Jones, G. I., Jackson, W. R., and Choi, C., J. Phys. Chem., 89, 294 (1985).Google Scholar
35. Pohlers, G., Scaiano, J. C., and Sinta, R. F., Chem. Mater., 9, 3222 (1997).Google Scholar
36. Cameron, J. F., Mori, J., Zydowsky, T. M., Kang, D., Sinta, R. F., King, M., Scaiano, J. C., Pohlers, G., Virdee, S., and Connolly, T., Proc. SPIE, 3333, 680 (1998).Google Scholar
37. Richter, E., Hien, S., and Sebald, M., Investigation of Acid Diffusion in Chemical Amplified Photoresists Using Photometric Methods, Fourth Int. Symp. On 193 nm Lithography, Telfs (1998).Google Scholar
38. Coenjarts, C., Cameron, J. F., Deschamps, N., Hambly, D., Pohlers, G., Scaiano, J. C., Sinta, R., Virdee, S., and Zampini, A., Proc. SPIE, 3678, 1062 (1999).Google Scholar
39. Coenjarts, C., Cameron, J. F., Pohlers, G., Scaiano, J. C., and Zampini, A., J. Vac. Sci. Technol. (in press).Google Scholar
40. Feke, G. D., Grober, R. D., Pohlers, G., Moore, K., and Cameron, J. F., Proc. 12th International Conference on Photopolymers, Society of Plastics Engineers, Mid-Hudson Section (in press).Google Scholar