Hostname: page-component-669899f699-rg895 Total loading time: 0 Render date: 2025-05-07T05:02:48.516Z Has data issue: false hasContentIssue false
  • English
  • Français

The Growth and Properties of Thin-Film Nano-Composites

Published online by Cambridge University Press:  10 February 2011

Keith L Lewis ,
A M Pitt  and
A G Culus
Keith L Lewis
Affiliation:
Defence Research Agency, St Andrews Road, Malvern, Worcs WR14 3PS, UK
A M Pitt
Affiliation:
Defence Research Agency, St Andrews Road, Malvern, Worcs WR14 3PS, UK
A G Culus
Affiliation:
Defence Research Agency, St Andrews Road, Malvern, Worcs WR14 3PS, UK
Get access

Abstract

Nano-composites allow a materials engineering approach to be exploited to realise specific characteristics in optical thin film ensembles. For example, films can be produced with refractive indices determined by their average composition on the basis of effective medium approximations, so freeing optical designers from the constraints imposed in pure materials. A summary is presented of the progress made in a fundamental study of films based on diverse materials such as fluorides and sulphides, fabricated using molecular beam deposition techniques. The film properties (eg refractive index, surface morphology, environmental stability) are correlated with microstructure (as determined by cross-sectional TEM techniques). The enhanced properties of the films are discussed in relation to the realisation of periodically modulated graded-index structures of the type required for optical filter applications.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 457: Symposium V – Nanophase and Nanocomposite Materials II , 1996 , 387
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

10. REFERENCES

1. Pulker, H K, Haag, W, E Moll: Swiss Pat Appl 00928/85–0, Mar 1985 Google Scholar
2. Guenther, K H: Proc Optical Interference Coatings Topical Meeting, OSA Tech Digest Series 6 247 (1988)Google Scholar
3. Seddon, R I, Temple, M D, Klinger, R E, Tuttle-Hart, T and LeFebvre, P M: Proc Optical Interference Coatings Topical Meeting, OSA Tech Digest Series 6 255 (1988)Google Scholar
4. Movchan, B A and Demchisin, A V: Phys Met Metallogr. 28 83 (1969)Google Scholar
5. Thornton, J A: J Vac Sci Technol 12 830 (1975)Google Scholar
6. Lewis, K L, Pitt, A M, Chew, N G, Cullis, A G, Wyatt-Davies, T J, Charlwood, L, Dosser, O D and Muirhead, I T “Fabrication of fluoride thin films using ultra-high vacuum techniques” Proc Boulder Damage Symposium NIST SP 752, 365–386 (1986)Google Scholar
7. Jacobbsen, R: Physics of Thin Films 8 51–98 (1975)Google Scholar
8. Farabaugh, E N, Sun, Y N, Sun, F, Feldman, A and Chen, H-H “A Study of thin film growth in the ZrO2-SiO2 system” Proc Boulder Damage Symposium NIST SP 752, 321–331 (1986)Google Scholar
9. Hall, K, Hill, J and Lewis, K L “The vaporisation kinetics of ZnSe and ZnS” Proc 6th Int Conf on Chem Vap Deposition, Publ Electrochem Soc V77–5, 36 (1977)Google Scholar
10. Guenther, A H: Laser-Induced Damage in Optical Materials - 25 year Index, SPIE V2162 (1994)Google Scholar
11. Kozlowski, M R and Chow, R “Role of defects in laser damage of multilayer coatings” Proc Boulder Damage Symposium SPIE V2114, 640–649 (1993)Google Scholar
12. Milward, J R, Lewis, K L, Sheach, K and Heinecke, R “Laser damage studies of silicon oxy-nitride narrow band reflectors” Proc Boulder Damage Symposium SPIE V1848, 255–264 (1992)Google Scholar
13. Gunning, W, Hall, R, Woodberry, F and Southwell, W: Proc Optical Interference Coatings Topical Meeting, OSA Tech Digest Series 6 126 (1988)Google Scholar