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Published online by Cambridge University Press: 10 February 2011
Total internal reflection (TIR) holographic lithography is studied as a new method for field emitter array (FEA) fabrication. Four basic parameters of the process - scan speed, laser power, focus distance and step distance, are analyzed to optimize the hole patterns. In addition, the characteristics of the Aluminum (Al) parting layer are studied to minimize the stress produced by Molybdenum (Mo) layer during Spindt-type tip formation process.