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Electron, Ion and Photon Beam Processing

Published online by Cambridge University Press:  25 February 2011

Kenji Gamo
Kenji Gamo*
Affiliation:
Faculty of Engineering Science and Research Center for Extreme materials, Osaka University, Toyonaka, Osaka 560, Japan
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Abstract

Beam processing techniques are increasingly important because of their unique capability as nano-device fabrication techniques. These are low temperature processing, high spacial resolution, high material and spacial selectivity and anisotropy, etc. For device fabrication, reduction of processinduced damage is crucial. In the present paper, basic characteristics of electron, ion and photon beam processing for etching and deposition are compared with putting emphasize on the effect of damage and promising techniques to minimize damage.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 236: Symposium B – Photons and Low Energy Particles in Surface Processing , 1991 , 523
Copyright
Copyright © Materials Research Society 1992

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References

1. Muray, A., Scheinfein, M. and Isaacson, M., J. Vac. Sci. Technol. B3 (1985) 367.Google Scholar
2. Kubena, R.L., Ward, J.W., stratton, F.P., Joyce, R.J. and Atkinson, G.M., J.Vac. Sci. Technol. (to be published)Google Scholar
3. Flanders, D.C., J. Vac. Sci. Technol. 16 (1979) 1615.Google Scholar
4. Watanabe, H. and Matsui, S., Appl. Phys. Lett. (1991)Google Scholar
5. Gamo, K., Y. Ochiai and Namba, S., Jpn. J. Appl. Phys. 21 (1982) L792.Google Scholar
6. Gamo, K., Takakura, Nobuyuki, Samoto, Norihiko, Shimizu, Ryuichi and Namba, Susumu, Jpn. J.Appl. Phys. 23 (1984) L293.CrossRefGoogle Scholar
7. Xu, Z., Kosugi, T., Gamo, K. and Namba, S., J. Vac. Sci. Technol. B7 (1989) 1959.Google Scholar
8. Mashiko, Y., Morimoto, H., Koyama, H., Kawazu, S., Kaito, T. and Adachi, T., 25th Annual Proc. 1987 Intern. Reliability Phys. Symp.(IEEE, 1987) p.111.Google Scholar
9. Shedd, G.M., Lezec, H., Dubner, A.D. and Melngailis, J., J. Vac. Sci. Technol. Appl. Phys. Lett. 49 (1986) 1584.Google Scholar
10. Solanki, R., Ritchi, W.H. and Collins, G.J., Appl. Phys. Lett. 43 (1983) 454 Google Scholar
11. Deutsch, T.F. and Rathman, D.D., Appl. Phys. Lett. 45 (1984) 623 CrossRefGoogle Scholar
12. Flynn, Diane K. and Steinfeld, Jeffrey I., J. Appl. Phys. 59 (1986) 3914 Google Scholar
14. Nishino, Shigehiro, Honda, Hiroki and Matsunami, Hiroyuki, Jpn. J. Appl. Phys. 25 (1986) L87.Google Scholar
15. Murakami, Kouichi, Proc. European MRS Summer School on Laser Ablation of Electronic Materials: Basic Mechanism and Applications (France, Sept. 1991) (in press).Google Scholar
16. Withrow, S.P. and Poker, D.B., Ion beam modification of materials (North-Holland, 1991)Google Scholar
17. Okuyama, Masanori, Nakamura, Masakazu and Hamakawa, Yoshihiro, Solid-State Electronics 33 (1990) 149.Google Scholar
18. Akazawa, H., Utsummi, Y., Takahashi, J. and Urisu, T., Appl. Phys. Lett. 57 (1990) 2302.CrossRefGoogle Scholar
19. Sato, Fumino, Goto, Katsuyuki and Chikawa, Jun-ichi, Jpn. J. Appl. Phys. 30 (1991) 1.205.Google Scholar
20. Sekine, M., Okano, A., Yamabe, K., Hayasaka, N. and Horiike, Y., Jpn. J. Appl. Phys. 25 (1986) 1111.Google Scholar
21. Yu, Jin-Zhong, Masui, Norio, Yuba, Yoshihiko, Hara, Tamio, Hamagaki, Manabu, Aoyagi, Yoshihiko, Gamo, Kenji and Namba, Susumu, Jpn. J. Appl. Phys. 28 (1989) 2391.Google Scholar
22. Yu, Jin-Zhong, Hara, Tamio, Hamagaki, Manabu, Aoyagi, Yoshihiko and Namba, Susumu, J. Vac. Sci. Technol. B6 (1988) 1626.CrossRefGoogle Scholar
23. Bohdansky, J., Nucl. Instrum. Methods, B2 (1984) 587.Google Scholar
24. Yamamura, Y. and Bohdansky, J., Vacuum 35 (1985) 561.CrossRefGoogle Scholar
25. Aoyagi, Yoshinobu, Shinmura, Kohji, Kawasaki, Kiyoshi, Nakamoto, Ichirou, Tanaka, Tomoko, Gamo, Kenji and Namba, Susumu, Appl. Phys. Lett. (to be published).Google Scholar
26. Maki, P.A. and Ehrlich, D.J., Appl. Phys. Lett. 55 (1989) 91.Google Scholar