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Electron Field Emission from Multilayered Tetrahedral Amorphous Carbon Films

Published online by Cambridge University Press:  10 February 2011

X. Shi ,
L. K. Cheah ,
S. R. P. Silva ,
B. K. Tay ,
H. S. Yang  and
Z. Sun
X. Shi
Affiliation:
School of EEE, Engineering, Nanyang Technological University, Singapore 639798, [email protected]
L. K. Cheah
Affiliation:
School of EEE, Engineering, Nanyang Technological University, Singapore 639798, [email protected]
S. R. P. Silva
Affiliation:
Department of Electronic and Electrical Engineering, University of Surrey, Guildford, GU2 5XH, UK
B. K. Tay
Affiliation:
School of EEE, Engineering, Nanyang Technological University, Singapore 639798, [email protected]
H. S. Yang
Affiliation:
School of EEE, Engineering, Nanyang Technological University, Singapore 639798, [email protected]
Z. Sun
Affiliation:
School of EEE, Engineering, Nanyang Technological University, Singapore 639798, [email protected]
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Abstract

The electron emission switching property of the multilayer structures, which constitute of nitrogen doped tetrahedral amorphous carbon (n+-ta-C) film and intrinsic ta-C layer fabricated by the filtered cathodic vacuum arc (FCVA) technique has been investigated. Low voltage DC bias (9V) was applied between the top and bottom layers in conjunction with the conventional electric field applied between the cathode and anode. It has been demonstrated that by varying the low DC bias polarity, the on-set electric field for the electron emission can be varied by ∼ ±6 V/μm compared to the unbiased situation. A possible mechanism for the multilayer field emission and the switching property is proposed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 498: Symposium AA – Covalently Bonded Disordered Thin-Film Materials , 1997 , 215
Copyright
Copyright © Materials Research Society 1998

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References

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