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Point-Contact-Spectroscopy of VSi2, Nbsi2 and Tasi2

Published online by Cambridge University Press:  03 September 2012

U. Gottlieb ,
O.P. Balkashin ,
A.G.M. Jansen ,
O. Laborde  and
R. Madar
U. Gottlieb
Affiliation:
Centre de Recherches sur les Très Basses Températures, CNRS, BP 166, 38042 Grenoble Cédex 9, France Laboratoire des Matériaux et du Génie Physique, ENSPG, INPG, BP 46, 38402 St. Martin d'Hères, France
O.P. Balkashin
Affiliation:
Laboratoire des Champs Magnétiques Intenses, CNRS-MPI, BP 166, 38042 Grenoble Cédex 9, France
A.G.M. Jansen
Affiliation:
Laboratoire des Champs Magnétiques Intenses, CNRS-MPI, BP 166, 38042 Grenoble Cédex 9, France
O. Laborde
Affiliation:
Centre de Recherches sur les Très Basses Températures, CNRS, BP 166, 38042 Grenoble Cédex 9, France Laboratoire des Champs Magnétiques Intenses, CNRS-MPI, BP 166, 38042 Grenoble Cédex 9, France
R. Madar
Affiliation:
Laboratoire des Matériaux et du Génie Physique, ENSPG, INPG, BP 46, 38402 St. Martin d'Hères, France
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Abstract

We present point-contact-spectroscopy measurements on VSi2, NbSi2 and TaSi2 high quality single crystals. These three compounds crystallise in the same hexagonal structure (structure C40, space group P6222) and they are isoelectronic. Phonon spectra deduced by this technique are in good agreement with phonon parameters previously obtained from resistivity and low temperature specific heat measured on the same samples.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 320: Symposium D – Silicides, Germanides, and Their Interfaces , 1993 , 485
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

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