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Nanosized Metallic Sn Precipitates in Si, Formed Upon Ion Implantation

Published online by Cambridge University Press:  15 February 2011

T. Barancira ,
J. De Wachter ,
K. Milants ,
J. Verheyden ,
W. Deweerd ,
J. Odeurs  and
H. Pattyn
T. Barancira
Affiliation:
Institute for Nuclear and Radiation Physics, K.U. Leuven, Celestijnenlaan 200D, 3001, Belgium.
J. De Wachter
Affiliation:
Institute for Nuclear and Radiation Physics, K.U. Leuven, Celestijnenlaan 200D, 3001, Belgium.
K. Milants
Affiliation:
Institute for Nuclear and Radiation Physics, K.U. Leuven, Celestijnenlaan 200D, 3001, Belgium.
J. Verheyden
Affiliation:
Institute for Nuclear and Radiation Physics, K.U. Leuven, Celestijnenlaan 200D, 3001, Belgium.
W. Deweerd
Affiliation:
Institute for Nuclear and Radiation Physics, K.U. Leuven, Celestijnenlaan 200D, 3001, Belgium.
J. Odeurs
Affiliation:
Institute for Nuclear and Radiation Physics, K.U. Leuven, Celestijnenlaan 200D, 3001, Belgium.
H. Pattyn
Affiliation:
Institute for Nuclear and Radiation Physics, K.U. Leuven, Celestijnenlaan 200D, 3001, Belgium.
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Abstract

In this work we firstly established the optimal conditions to preferentially form nanosized β-Sn inclusions from a supersaturated solid solution of Sn in Si, formed by a high dose ion implantation. Afterwards we tried to elucidate the origin of the strongly enhanced recoilless fraction of Sn nuclei inside these precipitates, thereby making a link to the observed shift in isomer shift value. This is tentatively interpreted in terms of a local compression of the inclusion to about 200 kbar.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 400: Symposium E – Metastable Metal-Based Phases and Microstructures , 1995 , 89
Copyright
Copyright © Materials Research Society 1996

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References

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