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Hard Amorphous Carbon Films Deposited by ArF Pulse Laser Ablation of Graphite at Room Temperature

Published online by Cambridge University Press:  25 February 2011

Fulin Xiong  and
R. P. H. Chang
Fulin Xiong
Affiliation:
Department of Materials Science and Engineering, and Materials Research Center Northwestern University, 2145 Sheridan Road, Evanston, IL 60208
R. P. H. Chang
Affiliation:
Department of Materials Science and Engineering, and Materials Research Center Northwestern University, 2145 Sheridan Road, Evanston, IL 60208
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Abstract

Hard amorphous carbon films have been deposited by ArF pulsed laser ablation of graphite at room temperature, with the laser power density of 5x108 W/cm2. The films prepared in the high vacuum environment possess remarkable diamond-like properties with a hardness up to 38 GPa and an optical energy band gap of 2.4 eV. The properties of the films doped with nitrogen vary with the nitrogen content, but improve interface adhesion, resulting in the extension of the film thickness limit to a greater range. The results suggest that the properties of the laser ablation deposited diamond-like carbon films depend not only on the laser power density, but also strongly on the laser wavelength or photon energy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 270: Symposium M – Novel Forms of Carbon , 1992 , 451
Copyright
Copyright © Materials Research Society 1992

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